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Increased Uniformity and Yield in Metal Plating

With ever-increasing miniaturization, the semiconductor plating industry is providing advanced IC packages to develop next-generation chip designs. To keep pace with technological improvements, pump systems must keep process precious plating solutions controlled, uniform, and with no particle generation.
Compared to Levitronix® pumps, magdrive centrifugal pumps contain mechanical slide bearings, which clog and fail due to the solution’s precipitation. Levitronix® pump systems are based on active magnetic levitation, which results in a significantly extended equipment uptime and a reliable, pulsation-free, and consistent flow. The absence of a mechanical bearing ensures virtually no particle generation.
Levitronix® pump systems are designed for demanding plating applications where consistent, uniform, and ultrapure processing will ensure the highest yield.

Company Levitronix
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