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ltx 1020 1648

Comparison of Four Pump Systems on the Particle Size Distribution of Cabot SiLECTTM 6000 Slurry

  • Microelectronics
  • CMP
  • Slurry
  • Pump Comparison
  • Pneumatic Pumps

In comparison to Levitronix® pumps, pneumatic pumps can cause shear stress due to check valves and other components. Shear stress in pumps can cause slurry agglomeration. Agglomerated slurry particles can lead to micro scratches causing wafer defectivity in CMP.

Test conditions
Two Levitronix® pumps, a diaphragm pump, and a bellows pump were evaluated for their effect on the health of Cabot SiLECTTM 6000 slurry. A fixed volume of slurry was recirculated at 30 lpm and 2.1 bar, and samples were drawn from the system at selected times for analysis. The particle size distribution of each sample was measured and the increase in particle concentration relative to the initial concentration was compared.

Little change in the particle size distribution was observed with Levitronix® pumps, regardless of particle size. With bellows and diaphragm pumps, significant increases particularly in the large particle concentrations were observed.


Concentration inreases measured during all tests after 1’000 turnovers

Author Marc Litchy
Company CT Associates
Document Number LTX 1020 1648
Pages 9