{"version":"1.0","provider_name":"Levitronix","provider_url":"https:\/\/www.levitronix.com\/zh-hans\/","author_name":"Sabrina Mueller","author_url":"https:\/\/www.levitronix.com\/zh-hans\/blog\/author\/sabrina-mueller\/","title":"BFS - Exhaust Pressure Boosting and Control - Levitronix","type":"rich","width":600,"height":338,"html":"<blockquote class=\"wp-embedded-content\" data-secret=\"eMjdcroZ3B\"><a href=\"https:\/\/www.levitronix.com\/zh-hans\/media-center\/bfs-exhaust-pressure-boosting-and-control\/\">BFS &#8211; Exhaust Pressure Boosting and Control<\/a><\/blockquote><iframe sandbox=\"allow-scripts\" security=\"restricted\" src=\"https:\/\/www.levitronix.com\/zh-hans\/media-center\/bfs-exhaust-pressure-boosting-and-control\/embed\/#?secret=eMjdcroZ3B\" width=\"600\" height=\"338\" title=\"&#8220;BFS &#8211; Exhaust Pressure Boosting and Control&#8221; &#8212; Levitronix\" data-secret=\"eMjdcroZ3B\" frameborder=\"0\" marginwidth=\"0\" marginheight=\"0\" scrolling=\"no\" class=\"wp-embedded-content\"><\/iframe><script type=\"text\/javascript\">\n\/* <![CDATA[ *\/\n\/*! This file is auto-generated *\/\n!function(d,l){\"use strict\";l.querySelector&&d.addEventListener&&\"undefined\"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!\/[^a-zA-Z0-9]\/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret=\"'+t.secret+'\"]'),o=l.querySelectorAll('blockquote[data-secret=\"'+t.secret+'\"]'),c=new RegExp(\"^https?:$\",\"i\"),i=0;i<o.length;i++)o[i].style.display=\"none\";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute(\"style\"),\"height\"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):\"link\"===t.message&&(r=new URL(s.getAttribute(\"src\")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener(\"message\",d.wp.receiveEmbedMessage,!1),l.addEventListener(\"DOMContentLoaded\",function(){for(var e,t,s=l.querySelectorAll(\"iframe.wp-embedded-content\"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute(\"data-secret\"))||(t=Math.random().toString(36).substring(2,12),e.src+=\"#?secret=\"+t,e.setAttribute(\"data-secret\",t)),e.contentWindow.postMessage({message:\"ready\",secret:t},\"*\")},!1)))}(window,document);\n\/* ]]> *\/\n<\/script>\n","thumbnail_url":"https:\/\/i0.wp.com\/www.levitronix.com\/app\/uploads\/2023\/01\/Thumbnail-BFS-Exhaust-Pressure-Boosting-and-Control.png?fit=384%2C232&ssl=1","thumbnail_width":384,"thumbnail_height":232,"description":"In semiconductor process chambers, electronic specialty gases are delivered in precise qualities to produce critical features on wafers. However, on the exhaust side, these gases frequently aren\u2019t purched accurately enough to meet the stringent position and repeatability requirements. Limited suction from this central exhaust line or tool expansion can lead to insufficient and fluctuating suction [&hellip;]"}