LEVITRONIX超純水研討會論文
Levitronix Conference 2013 - Ultrapure
- 1_All presentations_LUC2013_Ultrapure Day.zip
- A.Rastegar_Particle challenges in spinspray cleaning tools.pdf
- B.Reimer_Application of a high temperature MagLev pump system.pdf
- C.Fischer_SOM-an environmental friendly Post ash etch photo resist strip method on SW clean tools.pdf
- C.Gottschalk_POU Deoxification for Advanced Cleaning.pdf
- C.Russo_Spray Solvent Tool Semitool System Levitronix Pumps Upgrade.pdf
- F.Goebel_Reducing of Scrap in...sses through Maglev Pumps.pdf
- G.Zwicker_Establishment of a Wet Users Group.pdf
- I.Eichinger_State-of-the-Art Wet Spray Technology.pdf
- K.Gottfried_Precise bulk silicon wet etching.pdf
- L.Fabry_Field Experiences of Modern CMP and Ultrapure Cleaning Equipment.pdf
- M.Kellerer_Product Portfolio for Thin Film Photovoltaic.pdf
- M.Litchy_Evaluation of Particle Shedding and Trace Metal Extraction from Centrifugal Pumps.pdf
- T.Kopp_Process impacts of chemistry preparation on DHF process.pdf
Levitronix Conference 2013 - CMP
- 1_All presentations_LUC2013_CMP Day.zip.zip
- A.Philipossian_Aggressive diamond characterization and wear analysis during CMP.pdf
- B.Johl_Challenges of Large Particle Size Analysis in CMP Slurries.pdf
- C.Wacinski_Concentration Monitoring during blended of CMP Slurry.pdf
- D.Jeanjean_Impact of CMP Buffing Chemistry on Defects Level for Interconnections at CMOS 28nm.pdf
- K.Murai_In-Line Monitoring of Mean Particle Size.pdf
- P.Bridger_SDS Simulation for fumed silica based slurry.pdf
- P.Levy_Effective management of CMP distribution systems.pdf
- T.Hwang_Green Flipper Dual-Sided CMP conditioner.pdf
- U.Kuenzelmann_Morphological and Topological Effects during the CMP of Aluminium.pdf
- V.Balan_Tungsten CMP Working under Pressure.pdf
Past Ultrapure Conferences
- Ahmed Busnaina - Non Destructive Nanoparticle Removal from Submicron Structures Using Megasonic Cleaning.pdf
- Byron Palla - Successful New Chemistry Qualification for a Cost Conscious Industry.pdf
- Christoph Klement - Influence of different pumping technologies on the particle emission during wet processing.pdf
- Compact Static Mixing Units.pdf
- Effects of Size, Humidity, and Aging on Particle Removal.pdf
- Evaluation of Particle Shedding and Trace Metal Extraction from High Purity Pumps.pdf
- Fully Flexible Chemical Dispense System for SEZ Single Wafer Wet Cleaning Tools.pdf
- Gary Van Schooneveld - Measuring sub-50nm particle retention of UPW filters.pdf
- Gary Van Schooneveld - Modeling of component lifetime based on accelerated life tests and gas permeation measurements.pdf
- Gregg Conner - Critical Process System Solutions for the Semiconductor Industry.pdf
- Investigation of additives on the corrosion and cleaning efficiency of post CMP cleans.pdf
- Jin-Goo Park - Effect of Pumping Method on Wafer Cleaning.pdf
- Keith Kerwin - Magnetic Levitation Applications Clean Simple and Reliable.pdf
- Mark Litchy - Evaluation of Trace Metal Extraction from Eight High Purity Pumps.pdf
- Meeting Selectivity Needs with Unique Corrosion Inhibitors in Cleaning and Surface Finishing Practices.pdf
- Modeling of component lifetime based on accelerated acid gas permeation measurements.pdf
- Monitoring Nano-Particles in Liquid Systems.pdf
- New Particle Counter Technology for Measuring Liquid Chemicals and Slurries in Semiconductor Manufacturing.pdf
- Quantitative measurements of pattern damage and particle removal forces for below 45 nm wafer cleaning.pdf
- The Effect of Exposure Conditions on Component Life in HCl Solutions.pdf
- The Removal of Nanoparticles from Nanotrenches Using Megasonics.pdf
- UPW Immersion Lithography Purification Needs and Solutions.pdf
- Ursula Meyer - Improvements of wet chemical etch equipment (SAT) to support Infineon Zero Defect Strategy.pdf
- Wolfgang Dornfeld - Ultra Pure Fluid Handling User Conference 2011 Introduction.pdf
Past CMP Conferences
- Alain Chabourel - Poster - The solution for Critical Slurry Handling.pdf
- Alain Chabourel - PTM 1 - The Solution for Critical Slurry Handlling.pdf
- Alex Tregub - Abstract - Characterization of abrasive particle distribution in CMP slurries.pdf
- A New Method for Determining the Size Distribution of the Working Particles in CMP Slurries.pdf
- Benefits and Limitations of Slurry Particle Analysis and the Need for Next Generation Capabilities.pdf
- Budge Johl - Importance of Monitoring Slurry and Ultrapure Chemical Flow in CMP Applications.pdf
- Characterization of ILD scratches.pdf
- Chemical Mechanical Polishing of Hard Disk Drive Substrates.pdf
- CMP Challenges for ULK Integration.pdf
- CMP for More Than Moore.pdf
- CMP Pump Effects on Filter Life.pdf
- Correlation Between CMP LPC Sources and Substrate Defect Level.pdf
- Current and Future Flow Control Requirements for CMP.pdf
- Dispense Delivery Improvements to Existing Systems.pdf
- Effect of Pump Induced Particle Agglomeration On CMP of Ultra Low k Dielectrics.pdf
- Effect of Pump Type on the Health of Various CMP Slurries.pdf
- Effects of fluid handling components on slurry health.pdf
- Effects of Slurry Distribution using Diaphragm and Centrifugal pumps on the Defectivity in a Cu CMP Process.pdf
- From Submicron to Nano The View from the Editorâs Chair.pdf
- Fundamental Characterizations of Diamond Disc, Pad, and Retaining Ring Wear in Chemical Mechanical Planarization Processes.pdf
- Gerfried Zwicker - Power Device Fabrication Using CMP.pdf
- Highly Precise In-Situ Chemical Blending and Dispense System.pdf
- Importance of Optimized Slurry Filtration for Reducing Wafer Defects.pdf
- Investigation of New Maglev Day-Tank Technology for Effective Slurry Dispersion and Distribution.pdf
- Investigation of Valve Effects on Wafer Defectivity using an Oxide Slurry.pdf
- Issues Associated with Testing the Consistency of CMP Filtration Products.pdf
- Jin-Goo Park - CMP Scratches - Their Detection and Analysis on Root Causes.pdf
- Keeping Your CMP Slurry From Being A Pain in the As-Probed Die Yield.pdf
- Keiichi Kimura - Experimental analysis on material removal mechanism in CMP process for SiO2 film with AFM observation.pdf
- Key Factors that Influence Step Height Reduction Efficiency and Defectivity during Metal CMP.pdf
- Nanoscale Control and Analysis of the CMP Process A Case Study.pdf
- Notable Trends in CMP Past, Present and Future.pdf
- Optimized CMP for Device Structures Containing Ultra-Low-k Dielectrics.pdf
- Optimized CMP of ULK Dialectrics.pdf
- Particle Agglomeration Mechanisms in CMP Slurries.pdf
- Patrick Levy - A multi-step approach to developing filtration solutions for 22nm processes and beyond.pdf
- Performance of an Entegris pHasor X Heat Exchanger in Cabot Semi-Sperse 12.pdf
- Post CMP Defects Their Origin and Removal.pdf
- Production of ultra-flat semiconductor wafer substrates using advanced optical lens polishing technology.pdf
- Pump Induced Slurry Handling Effects on CMP Performance.pdf
- Quantitative Determination of Slurry Stability and Stress Response in CMP Slurries.pdf
- Rajiv K. Singh - Quantification of Particle Agglomeration during chemical Mechanical Polishing of Metals and Dieelectrics.pdf
- Rakesh K. Singh - New Developments in the Characterization of CMP Pad Conditioners.pdf
- Robert L. Rhoades - New CMP Applications and Opportunities for Improvement.pdf
- Ru CMP Slurry for Ru Bottom Elelctrode Formation.pdf
- S.V. Babu - Slurry Formation Options Challenges for Defect Reductin in CU Ta TaN and Ru Planatization.pdf
- Slurry Flow Monitoring for Cost Reduction.pdf
- Slurry Handling, Troubleshooting and Filtration.pdf
- Slurry Pump Effects on Distribution and Point of Use CMP Systems.pdf
- Solution Chemistry Effects on Cracking and Damage during CMP.pdf
- Stability of Colloidal Suspensions for CMP Applications.pdf
- Surface Mediated Particle-particle Aggregation During CMP Slurry Delivery and Handling.pdf
- Susceptibility of Different Slurry Types to Agglomeration.pdf
- Valve Selection Criteria for CMP Slurry.pdf
- Why do Specific Pumps Increase Over-Size Particle Size Distribution in CMP Slurries.pdf
- Wolfgang Dornfeld - CMP User Conference 2011 Introduction.pdf