Levitronix Conference Papers 2011 - CMP

Alain Chabourel - Poster - The solution for Critical Slurry Handling.pdf (127.5 kB)

Alain Chabourel - PTM 1 - The Solution for Critical Slurry Handlling.pdf (524.8 kB)

Alex Tregub - Abstract - Characterization of abrasive particle distribution in CMP slurries.pdf (84.9 kB)

Budge Johl - Importance of Monitoring Slurry and Ultrapure Chemical Flow in CMP Applications.pdf (2.5 MB)

Gerfried Zwicker - Power Device Fabrication Using CMP.pdf (1.0 MB)

Jin-Goo Park - CMP Scratches - Their Detection and Analysis on Root Causes.pdf (3.6 MB)

Keiichi Kimura - Experimental analysis on material removal mechanism in CMP process for SiO2 film with AFM observation.pdf (5.1 MB)

Patrick Levy - A multi-step approach to developing filtration solutions for 22nm processes and beyond.pdf (973.3 kB)

Rajiv K. Singh - Quantification of Particle Agglomeration during chemical Mechanical Polishing of Metals and Dieelectrics.pdf (5.1 MB)

Rakesh K. Singh - New Developments in the Characterization of CMP Pad Conditioners.pdf (1.2 MB)

Robert L. Rhoades - New CMP Applications and Opportunities for Improvement.pdf (974.7 kB)

S.V. Babu - Slurry Formation Options Challenges for Defect Reductin in CU Ta TaN and Ru Planatization.pdf (1.7 MB)

Wolfgang Dornfeld - CMP User Conference 2011 Introduction.pdf (659.6 kB)

Levitronix Conference Papers 2011 - Ultrapure

Ahmed Busnaina - Non Destructive Nanoparticle Removal from Submicron Structures Using Megasonic Cleaning.pdf (3.0 MB)

Byron Palla - Successful New Chemistry Qualification for a Cost Conscious Industry.pdf (339.9 kB)

Christoph Klement - Influence of different pumping technologies on the particle emission during wet processing.pdf (1.1 MB)

Gary Van Schooneveld - Measuring sub-50nm particle retention of UPW filters.pdf (572.9 kB)

Gary Van Schooneveld - Modeling of component lifetime based on accelerated life tests and gas permeation measurements.pdf (1.9 MB)

Gregg Conner - Critical Process System Solutions for the Semiconductor Industry.pdf (1.2 MB)

Jin-Goo Park - Effect of Pumping Method on Wafer Cleaning.pdf (4.1 MB)

Keith Kerwin - Magnetic Levitation Applications Clean Simple and Reliable.pdf (893.9 kB)

Mark Litchy - Evaluation of Trace Metal Extraction from Eight High Purity Pumps.pdf (194.0 kB)

Ursula Meyer - Improvements of wet chemical etch equipment (SAT) to support Infineon Zero Defect Strategy.pdf (620.0 kB)

Wolfgang Dornfeld - Ultra Pure Fluid Handling User Conference 2011 Introduction.pdf (1.1 MB)

Levitronix Conference Papers Ultrapure

Compact Static Mixing Units.pdf (1.2 MB)

Effects of Size, Humidity, and Aging on Particle Removal.pdf (2.4 MB)

Evaluation of Particle Shedding and Trace Metal Extraction from High Purity Pumps.pdf (157.9 kB)

Fully Flexible Chemical Dispense System for SEZ Single Wafer Wet Cleaning Tools.pdf (171.4 kB)

Investigation of additives on the corrosion and cleaning efficiency of post CMP cleans.pdf (760.1 kB)

Meeting Selectivity Needs with Unique Corrosion Inhibitors in Cleaning and Surface Finishing Practices.pdf (3.1 MB)

Modeling of component lifetime based on accelerated acid gas permeation measurements.pdf (535.4 kB)

Monitoring Nano-Particles in Liquid Systems.pdf (1.4 MB)

New Particle Counter Technology for Measuring Liquid Chemicals and Slurries in Semiconductor Manufacturing.pdf (819.9 kB)

Quantitative measurements of pattern damage and particle removal forces for below 45 nm wafer cleaning.pdf (3.1 MB)

The Effect of Exposure Conditions on Component Life in HCl Solutions.pdf (411.9 kB)

The Removal of Nanoparticles from Nanotrenches Using Megasonics.pdf (2.9 MB)

UPW Immersion Lithography Purification Needs and Solutions.pdf (690.1 kB)

Levitronix Conference Papers CMP

A New Method for Determining the Size Distribution of the Working Particles in CMP Slurries.pdf (543.0 kB)

Benefits and Limitations of Slurry Particle Analysis and the Need for Next Generation Capabilities.pdf (3.2 MB)

Characterization of ILD scratches.pdf (1.8 MB)

Chemical Mechanical Polishing of Hard Disk Drive Substrates.pdf (1.0 MB)

CMP Challenges for ULK Integration.pdf (588.6 kB)

CMP for More Than Moore.pdf (1.7 MB)

CMP Pump Effects on Filter Life.pdf (1.1 MB)

Correlation Between CMP LPC Sources and Substrate Defect Level.pdf (1.0 MB)

Current and Future Flow Control Requirements for CMP.pdf (794.3 kB)

Dispense Delivery Improvements to Existing Systems.pdf (1.5 MB)

Effect of Pump Induced Particle Agglomeration On CMP of Ultra Low k Dielectrics.pdf (471.2 kB)

Effect of Pump Type on the Health of Various CMP Slurries.pdf (317.9 kB)

Effects of fluid handling components on slurry health.pdf (262.4 kB)

Effects of Slurry Distribution using Diaphragm and Centrifugal pumps on the Defectivity in a Cu CMP Process.pdf (1.3 MB)

From Submicron to Nano The View from the Editor’s Chair.pdf (408.9 kB)

Fundamental Characterizations of Diamond Disc, Pad, and Retaining Ring Wear in Chemical Mechanical Planarization Processes.pdf (1.6 MB)

Highly Precise In-Situ Chemical Blending and Dispense System.pdf (271.6 kB)

Importance of Optimized Slurry Filtration for Reducing Wafer Defects.pdf (1.2 MB)

Investigation of New Maglev Day-Tank Technology for Effective Slurry Dispersion and Distribution.pdf (635.7 kB)

Investigation of Valve Effects on Wafer Defectivity using an Oxide Slurry.pdf (571.5 kB)

Issues Associated with Testing the Consistency of CMP Filtration Products.pdf (1.1 MB)

Keeping Your CMP Slurry From Being A Pain in the As-Probed Die Yield.pdf (277.3 kB)

Key Factors that Influence Step Height Reduction Efficiency and Defectivity during Metal CMP.pdf (1.0 MB)

Nanoscale Control and Analysis of the CMP Process A Case Study.pdf (2.4 MB)

Notable Trends in CMP Past, Present and Future.pdf (3.1 MB)

Optimized CMP for Device Structures Containing Ultra-Low-k Dielectrics.pdf (3.3 MB)

Optimized CMP of ULK Dialectrics.pdf (637.5 kB)

Particle Agglomeration Mechanisms in CMP Slurries.pdf (1.1 MB)

Performance of an Entegris pHasor® X Heat Exchanger in Cabot Semi-Sperse® 12.pdf (141.7 kB)

Post CMP Defects Their Origin and Removal.pdf (3.3 MB)

Production of ultra-flat semiconductor wafer substrates using advanced optical lens polishing technology.pdf (431.0 kB)

Pump Induced Slurry Handling Effects on CMP Performance.pdf (1.4 MB)

Quantitative Determination of Slurry Stability and Stress Response in CMP Slurries.pdf (1.0 MB)

Ru CMP Slurry for Ru Bottom Elelctrode Formation.pdf (2.6 MB)

Slurry Flow Monitoring for Cost Reduction.pdf (1.3 MB)

Slurry Handling, Troubleshooting and Filtration.pdf (5.1 MB)

Slurry Pump Effects on Distribution and Point of Use CMP Systems.pdf (394.8 kB)

Solution Chemistry Effects on Cracking and Damage during CMP.pdf (828.0 kB)

Stability of Colloidal Suspensions for CMP Applications.pdf (2.7 MB)

Surface Mediated Particle-particle Aggregation During CMP Slurry Delivery and Handling.pdf (1.2 MB)

Susceptibility of Different Slurry Types to Agglomeration.pdf (296.7 kB)

Valve Selection Criteria for CMP Slurry.pdf (721.7 kB)

Why do Specific Pumps Increase Over-Size Particle Size Distribution in CMP Slurries.pdf (472.8 kB)