|
This Conference follows our
CMP Users' Conference 2008
Who should attend…
- All those involved in the design and/or manufacture of wafer coating or cleaning equipment.
- All those responsible for chemical delivery systems and chemical processing within a wafer fab.
- All those concerned with process control, surface analysis, and yield enhancement.
The Ultrapure Conference will focus on technological advances and solutions to problems we all face. The conference will cover such topics as: UPW in Immersion Lithography, in-tool blending, wet cleaning overview, particle shedding, pattern damage and particle removal forces, and “green” chemistries.
Conference participants will benefit from real-world case studies. Ample opportunity will be provided to network with key industry executives, experts, and end-users.
Ultrapure Fluid Users Conference 2008 Presentations
For more information contact:
Christos Monovoukas
cmonovoukas@levitronix.com
(781) 622-5074
|
Contact Us