Levitronix Ultrapure Fluid Users Conference 2008 | English |
"Ultrapure_Revised_Speaker_Schedule_2008"
|  32 kB |
"Ultra Pure Water Immersion Lithography: Purification Needs and Solutions"
Gregg Conner, Entegris, Inc.
| 827 kB |
"Process to drain and reclaim – A highly flexible chemical dispense system for SEZ single wafer wet cleaning tools. "
Bernhard Loidl, SEZ Inc.
| 390 kB |
"Material and component selection and evaluation for ultrapure water and process chemical systems in the semiconductor industry "
Jens Tschmelak, M+W Zander
| 1112 kB |
"Evaluation of Particle Shedding and Trace Metal Extraction from High Purity Pumps"
Mark R. Litchy, CT Associates, Inc.
| 204 kB |
"Meeting Selectivity Needs with Unique Corrosion Inhibitors in Cleaning and Surface Finishing Practices"
John Moore, DAETEC, LLC
| 3069 kB |
"The effect of exposure conditions on component life in HCl solutions"
Don Grant, CT Associates, Inc.
| 816 kB |
"Developing a method to match in-situ metrology to chemical concentration requirements "
Charlie Peterson, Edwards Ltd.
| 360 kB |
"Single-Wafer Marangoni Drying for Advanced Technology Node Cleaning Applications "
James (Jim) Papanu, Ph.D.
| 1254 kB |
"Quantitative measurements of pattern damage and particle removal forces for below 45 nm wafer cleaning"
Jin-Goo Park, Div. of Materials and Chemical Engineering Hanyang University, Korea
| 3005 kB |
"Monitoring Nanoparticles in Liquid Systems"
Ross Bryant, Particle Measuring Systems Inc.
| 1331 kB |
"Investigation of additives on the corrosion and cleaning efficiency of post CMP cleans "
Robert Donis, Air Liquide
| 742 kB |
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