Levitronix CMP Users Conference 2008 | English |
"Optimized CMP of Ultra-Low-k Dielectrics "
Reinhold H. Dauskardt, Dpt. of Materials Science and Engineering, Stanford University
|  622 kB |
"CMP Challenges for Ultra Low K Integration "
Gautam Banerjee of Air Products and Chemicals, Inc.
| 574 kB |
"Correction between CMP LPC Sources and Substrate Defect Level "
Yuzhuo Li, Yongqing Lan, Reto Schoeb
| 1096 kB |
"Fundamental Characterizations of Pad, Diamond Disc, and Retaining Ring Wear"
Yun Zhuang, Araca Inc., Ara Philipossian, Araca Inc. And University of Arizona, Leonard Borucki, Araca Inc
| 3139 kB |
"Why do Specific Pumps Increase Over-Size Particle Size Distribution in CMP Slurries?"
Rajiv Singh, Particle Engineering Research Center, U. of Florida
| 461 kB |
"A New Method for Determining the Size Distribution of the Working Particles in CMP Slurries"
Don Gant, CT Associates, Inc.
| 530 kB |
"Investigation of New MagLev Day-Tank Technology for Maintaining Slurry Dispersion and Health"
Budge Johl, Rohm and Haas Electronic Materials
| 620 kB |
"Slurry Flow Monitoring for Cost Reduction "
Alain Chabourel, STMicro, Rousset
| 1225 kB |
"Ru CMP Slurry for Ru Bottom Electrode Formation "
Jin-Goo Park, Div. of Materials and Chemical Engineering Hanyang University, Korea
| 2546 kB |
"Material and component selection and evaluation for CMP supply systems in the semiconductor industry "
Jens Tschmelak, Andreas Neuber, M+W Zander
| 2402 kB |
"Pump Retrofits: Effects on Overall Production"
Jeff Wilmer, Brian Orzechowski, DivInd LLC
| 1466 kB |
"Handling, Filtration and Polishing Performance Characterization of Next Generation CMP Slurries"
Rakesh K. Singh†, Christopher R. Wargo†, Bill Mullee* and Benno Milmore‡
Entegris, Inc.†, Silco Electronic Materials* and ON Semiconductor‡
| 1326 kB |
"Testing the Entegris pHasor® X Heat Exchanger in Cabot Semi-Sperse® 12"
Mark Litchy, Dennis Chilcote and Don Grant, CT Associates, Inc., Bipin Parekh, Annie Xia, Michael Clarke, and Russ Mollica, Entegris
| 138 kB |
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