Levitronix CMP Users Conference 2006 | English |
"Keynote Presentation"
Tom Cheyney, MICRO Magazine
|  399 kB |
"Inline Slurry Blending System In Mirra-Mesa Equipment"
Bernard Yap Tzen Hian, 1st Silicon.
| 307 kB |
"Maximizing pressure and pressure stability in a CMP global distribution with centrifugal pumps."
Dr. Ben Roberts, David Gerken, BOC Edwards.
| 377 kB |
"Investigation of Some Key Factors that Influence Step Height Reduction Efficiency and Defectivity during Metal CMP"
Prof. Yuzhuo Li, Clarkson University.
| 977 kB |
"Tribological Information on PVA Brushes in Cu Post-CMP Cleaning Applications"
Gilbert Parry, Entegris.
| 900 kB |
"Effect of Pump Induced Particle Agglomeration On CMP of Ultra Low k Dielectrics"
Prof. Rajij Singh, University of Florida.
| 460 kB |
"Particle Agglomeration Mechanisms in CMP Slurries"
Mark Litchy, CT Associates, Inc.
| 1032 kB |
"Importance of Optimized Slurry Filtration for Reducing Wafer Defects"
Budge Johl, Rohm and Haas Electronic Materials.
| 1206 kB |
"Slurry Pump Effects on CMP"
Robert Donis, LSI.
| 385 kB |
"Current and Future Flow Control Requirements for CMP"
David Albrecht, Entegris.
| 775 kB |
"Valve Selection Criteria for CMP Slurry"
Adam Herbert, Asahi America.
| 704 kB |
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